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Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11
Figure 1: Optical microscopy images showing the 200 nm SiO2/Si substrate and gold electrodes together with (a...
Figure 2: SEM-based average diameters of Co, Cu and Au FEBID agglomerates as function of the annealing temper...
Figure 3: Top: Raman spectra in the carbon range as a function of the post-growth annealing temperature of (a...
Figure 4: Electrical resistivities of Co–C, Cu–C and Au–C FEBID materials as a function of the annealing temp...
Figure 5: (a) Time-evolution of the electrical resistance during annealing in a 200 ppm H2 atmosphere, reveal...
Beilstein J. Nanotechnol. 2015, 6, 1935–1936, doi:10.3762/bjnano.6.196
Figure 1: Figure 8 in the original article: Calculated resistivity from the resistance measurement of a Cu–C ...
Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156
Figure 1: Sketch of post-growth annealing experiments: a) conventional heating using a hot plate in an SEM, b...
Figure 2: TEM of as-deposited lines and squares from Cu(hfac)2 on an amorphous carbon membrane on a TEM grid....
Figure 3: Post-growth annealing of FEBID line from Cu(hfac)2 between four gold electrodes. SEM tilt images (6...
Figure 4: Post-growth laser annealing of FEBID deposits from Cu(hfac)2. SEM top view images of a) as-deposite...
Figure 5: Periodic 3D FEBID line deposits from (hfac)Cu(DMB) between gold electrodes on SiO2/Si. SEM tilt ima...
Figure 6: In situ TEM annealing for 10 min at 220 °C on a line deposit from Cu(hfac)2 shown in Figure 2. a) STEM high...
Figure 7: TEM in situ annealing of FEBID rods grown from (hfac)Cu(VTMS). a) Dark field image of an as-deposit...
Figure 8: Calculated resistivity from the resistance measurement of a Cu–C line during in situ post-growth he...